Advances in CMP/polishing technologies for the manufacture of electronic devices
by
Doi, Toshiro.
Title
:
Advances in CMP/polishing technologies for the manufacture of electronic devices
Author
:
Doi, Toshiro.
ISBN
:
9781437778595
Edition
:
1st ed.
Publication Information
:
Oxford : William Andrew, 2012.
Physical Description
:
1 online resource (xii, 317 p.)
Subject Term
:
Electrolytic polishing.
Grinding and polishing.
Added Author
:
Doi, Toshiro.
Marinescu, Ioan D.
Kurokawa, Syuhei.
Electronic Access
:
Library | Material Type | Item Barcode | Shelf Number | [[missing key: search.ChildField.HOLDING]] | Status |
---|
Online Library | E-Book | 146106-2001 | ONLINE | | Elektronik Kütüphane |