Advances in CMP/polishing technologies for the manufacture of electronic devices
by
 
Doi, Toshiro.

Title
: 
Advances in CMP/polishing technologies for the manufacture of electronic devices

Author
: 
Doi, Toshiro.

ISBN
: 
9781437778595

Edition
: 
1st ed.

Publication Information
: 
Oxford : William Andrew, 2012.

Physical Description
: 
1 online resource (xii, 317 p.)

Subject Term
: 
Electrolytic polishing.
 
Grinding and polishing.

Added Author
: 
Doi, Toshiro.
 
Marinescu, Ioan D.
 
Kurokawa, Syuhei.

Electronic Access
: 
ScienceDirect http://www.sciencedirect.com/science/book/9781437778595


LibraryMaterial TypeItem BarcodeShelf Number[[missing key: search.ChildField.HOLDING]]Status
Online LibraryE-Book146106-2001ONLINEElektronik Kütüphane