Plasma etching processes for CMOS device realization
by
 
Posseme, Nicolas, editor.

Title
: 
Plasma etching processes for CMOS device realization

Author
: 
Posseme, Nicolas, editor.

ISBN
: 
9780081011966

Physical Description
: 
1 online resource (x, 121 pages) : illustrations

Subject Term
: 
Plasma etching.
 
Metal oxide semiconductors, Complementary.

Added Author
: 
Posseme, Nicolas,

Electronic Access
: 
ScienceDirect http://www.sciencedirect.com/science/book/9781785480966


LibraryMaterial TypeItem BarcodeShelf Number[[missing key: search.ChildField.HOLDING]]Status
Online LibraryE-Book459350-1001ONLINEElektronik Kütüphane