Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
by
 
Samukawa, Seiji. author.

Title
: 
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

Author
: 
Samukawa, Seiji. author.

ISBN
: 
9784431547952

Edition
: 
1st ed. 2014.

Physical Description
: 
VIII, 40 p. 35 illus., 30 illus. in color. online resource.

Series
: 
SpringerBriefs in Applied Sciences and Technology,

Subject Term
: 
Nanotechnology.
 
Nanoscale science.
 
Nanoscience.
 
Plasma (Ionized gases).
 
Semiconductors.

Added Corporate Author
: 
SpringerLink (Online service)

Electronic Access
: 
https://doi.org/10.1007/978-4-431-54795-2


LibraryMaterial TypeItem BarcodeShelf Number[[missing key: search.ChildField.HOLDING]]Status
Online LibraryE-Book489259-1001ONLINEElektronik Kütüphane