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1. 
Cover image for Tribology in chemical-mechanical planarization
Tribology in chemical-mechanical planarization
Author 
Liang, Hong. Craven, David.
Preferred Shelf Number 
TJ1075 .L53 2005
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Beytepe Library~1
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2. 
Cover image for Advances in chemical mechanical planarization (CMP)
Advances in chemical mechanical planarization (CMP)
Author 
Babu, S. V., editor.
Preferred Shelf Number 
ONLINE
Electronic Access 
ScienceDirect http://www.sciencedirect.com/science/book/9780081001653
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3. 
Cover image for Microelectronic applications of chemical mechanical planarization
Microelectronic applications of chemical mechanical planarization
Author 
Li, Yuzhuo. Wiley InterScience (Online service)
Preferred Shelf Number 
ONLINE
Electronic Access 
Contributor biographical information http://catdir.loc.gov/catdir/enhancements/fy0742/2007015557-b.html
John Wiley http://dx.doi.org/10.1002/9780470180907
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4. 
Cover image for Tribology in chemical-mechanical planarization
Tribology in chemical-mechanical planarization
Author 
Liang, Hong, 1961- Craven, David R., 1945-
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ONLINE
Electronic Access 
Distributed by publisher. Purchase or institutional license may be required for access.
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5. 
Cover image for Chemical mechanical planarization of microelectronic materials
Chemical mechanical planarization of microelectronic materials
Author 
Steigerwald, Joseph M. Murarka, S. P. Gutmann, Ronald J. Wiley InterScience (Online service)
Preferred Shelf Number 
ONLINE
Electronic Access 
John Wiley http://dx.doi.org/10.1002/9783527617746
Contributor biographical information http://catdir.loc.gov/catdir/bios/wiley041/96006198.html
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6. 
Cover image for Nanoparticle engineering for chemical-mechanical planarization fabrication of next-generation nanodevices
Nanoparticle engineering for chemical-mechanical planarization fabrication of next-generation nanodevices
Author 
Paik, Ungyu. Park, Jea-Gun.
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ONLINE
Electronic Access 
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