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1. 
Cover image for Handbook of chemicals and gases for the semiconductor industry
Handbook of chemicals and gases for the semiconductor industry
Author 
Miśra, Āśutosha, 1970- Hogan, Jeremiah D. Chorush, Russell.
Preferred Shelf Number 
ONLINE
Electronic Access 
Wiley InterScience An electronic book accessible through the World Wide Web; click for information
Access restricted to McGill users
HathiTrust Digital Library Limited view (search only) http://catalog.hathitrust.org/api/volumes/oclc/47863246.html
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2. 
Cover image for Nonlinear optical parametric processes in liquids and gases
Nonlinear optical parametric processes in liquids and gases
Author 
Reintjes, John F.
Preferred Shelf Number 
ONLINE
Electronic Access 
ScienceDirect http://www.sciencedirect.com/science/book/9780125859806
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3. 
Cover image for Kinetics of gas reactions.
Kinetics of gas reactions.
Author 
Jost, Wilhelm, 1903-1988.
Preferred Shelf Number 
ONLINE
Electronic Access 
ScienceDirect http://www.sciencedirect.com/science/book/9780122456565
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4. 
Cover image for Handbook on plasma instabilities
Handbook on plasma instabilities
Author 
Cap, Ferdinand.
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ONLINE
Electronic Access 
ScienceDirect http://www.sciencedirect.com/science/book/9780121591014
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5. 
Cover image for IMAGINING AND ENACTING POST-CARBON FUTURES transition studies.
IMAGINING AND ENACTING POST-CARBON FUTURES transition studies.
Preferred Shelf Number 
TD885.5 .C3
Electronic Access 
Taylor & Francis https://www.taylorfrancis.com/books/9781003509585
OCLC metadata license agreement http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf
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6. 
Cover image for Applications of the surface renewal model of mass transfer
Applications of the surface renewal model of mass transfer
Author 
Huang, Hengshuo, author. Chatterjee, Siddharth G., author.
Preferred Shelf Number 
TP156 .M3 H86 2026
Electronic Access 
https://onlinelibrary.wiley.com/doi/book/10.1002/9781394312856
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7. 
Cover image for Plasma assisted combustion and chemical processing
Plasma assisted combustion and chemical processing
Author 
Ju, Yiguang, author. Starikovskiy, Andrey, author.
Preferred Shelf Number 
TP156 .P5
Electronic Access 
Taylor & Francis https://www.taylorfrancis.com/books/9781003203063
OCLC metadata license agreement http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf
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8. 
Cover image for Practical process design for chemical engineers
Practical process design for chemical engineers
Author 
Marchildon, Keith, author. Mody, David, author.
Preferred Shelf Number 
TP155.7
Electronic Access 
https://onlinelibrary.wiley.com/doi/book/10.1002/9781394203871
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9. 
Cover image for Nanochitosan applications for enhanced crop production and food security
Nanochitosan applications for enhanced crop production and food security
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S494.5 .B563 N36 2025
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https://onlinelibrary.wiley.com/doi/book/10.1002/9781394214945
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10. 
Cover image for Thermoelectrics : design and materials
Thermoelectrics : design and materials
Author 
Lee, HoSung, author.
Preferred Shelf Number 
TK2950 .L44 2025
Electronic Access 
https://onlinelibrary.wiley.com/doi/book/10.1002/9781394317387
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11. 
Cover image for Hydrogen safety : production, transport, storage, use, and the environment
Hydrogen safety : production, transport, storage, use, and the environment
Author 
Rigas, Fotis, author.
Preferred Shelf Number 
TP245 .H9
Electronic Access 
Taylor & Francis https://www.taylorfrancis.com/books/10.1201/9781003313007
OCLC metadata license agreement http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf
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12. 
Cover image for Supercritical adsorption for cleaner energy and the environment
Supercritical adsorption for cleaner energy and the environment
Author 
Zhou, Li, author
Preferred Shelf Number 
QD547
Electronic Access 
https://onlinelibrary.wiley.com/doi/book/10.1002/9783527851676
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