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37. 
Cover image for Microelectronic applications of chemical mechanical planarization
Microelectronic applications of chemical mechanical planarization
Author 
Li, Yuzhuo. Wiley InterScience (Online service)
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Contributor biographical information http://catdir.loc.gov/catdir/enhancements/fy0742/2007015557-b.html
John Wiley http://dx.doi.org/10.1002/9780470180907
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38. 
Cover image for Silicon heterostructure devices
Silicon heterostructure devices
Author 
Cressler, John D.
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39. 
Cover image for Measurement and modeling of silicon heterostructure devices
Measurement and modeling of silicon heterostructure devices
Author 
Cressler, John D.
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40. 
Cover image for Handbook of 3D integration technology and applications of 3D integrated circuits
Handbook of 3D integration technology and applications of 3D integrated circuits
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Garrou, Philip E. Bower, Christopher Andrew. Ramm, Peter. Wiley InterScience (Online service)
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John Wiley http://dx.doi.org/10.1002/9783527623051
ebrary http://site.ebrary.com/id/10577606
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41. 
Cover image for Understanding fabless IC technology
Understanding fabless IC technology
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Hurtarte, Jeorge S. Wolsheimer, Evert A. Tafoya, Lisa M.
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ScienceDirect http://www.sciencedirect.com/science/book/9780750679442
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42. 
Cover image for Synchronization and arbitration in digital systems
Synchronization and arbitration in digital systems
Author 
Kinniment, David. Wiley InterScience (Online service)
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John Wiley http://dx.doi.org/10.1002/9780470517147
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43. 
Cover image for Fundamental principles of optical lithography the science of microfabrication
Fundamental principles of optical lithography the science of microfabrication
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Mack, Chris A. Wiley InterScience (Online service)
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John Wiley http://dx.doi.org/10.1002/9780470723876
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44. 
Cover image for Low Power and Low Voltage Circuit Design with the FGMOS Transistor
Low Power and Low Voltage Circuit Design with the FGMOS Transistor
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Rodriguez-Villegas, E.
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http://dx.doi.org/10.1049/PBCS020E
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45. 
Cover image for Fundamentals of semiconductor manufacturing and process control
Fundamentals of semiconductor manufacturing and process control
Author 
May, Gary S. Spanos, Costas J.
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IEEE Xplore http://ieeexplore.ieee.org/xpl/bkabstractplus.jsp?bkn=5201952
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46. 
Cover image for ESD RF technology and circuits
ESD RF technology and circuits
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Voldman, Steven H. Wiley InterScience (Online service)
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Volltext http://www3.interscience.wiley.com/cgi-bin/bookhome/113386521
http://www3.interscience.wiley.com/cgi-bin/bookhome/113386521/ProductInformation.html
John Wiley http://dx.doi.org/10.1002/0470061405
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47. 
Cover image for EDA for IC implementation, circuit design, and process technology
EDA for IC implementation, circuit design, and process technology
Author 
Scheffer, Lou. Lavagno, Luciano, 1959- Martin, Grant (Grant Edmund)
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48. 
Cover image for Scientific wet process technology for innovative LSI/FPD manufacturing
Scientific wet process technology for innovative LSI/FPD manufacturing
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Ohmi, Tadahiro, 1939-
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