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Lamprou, Dimitrios, editor. Douroumis, Dennis, editor. Qi, Sheng (Researcher in pharmaceutics), editor.
Preferred Shelf Number 
RS210 .A14 2024
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Brasseur, Martine. Bartoli, Annie. Chabaud, Didier. Grouiez, Pascal. Rouet, Gilles.
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HF5549.5 .M5
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Srivastava, Jay Prakash, editor. Kozak, Drazan, editor. Ranjan, Vinayak, editor. Kumar, Pankaj, editor. Kumar, Ranjan, editor.
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TJ145
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Shen, Shaohua, editor. Wang, Shuangyin, editor.
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QD505
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American Institute of Chemical Engineers. Center for Chemical Process Safety, issuing body. John Wiley & Sons, publisher.
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T55
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Julia, Guilhem, editor. Fauchon, Anne, editor. Kanawati, Rushed, editor.
Preferred Shelf Number 
R859.7 .A78 A3 2024
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Yalaoui, Farouk, editor.
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HD45 .C66 2024
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Moreno, Carlos, 1959- author. Gehl, Jan, 1936- author of foreword. Thorne, Martha, author of afterword.
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HD75.6
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HV551.2 .D57 2024
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Catellani, Andrea, editor. Lits, Grégoire, editor.
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QH541 .T73 2024
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Sanjay, H. S., author. Niranjanamurthy, M., author. John Wiley & Sons.
Preferred Shelf Number 
RC78.7 .D53 M43 2023
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Ellingham, Sarah, editor. Adserias-Garriga, Joe, editor. Zapico, Sara C., editor. Ubelaker, Douglas H., editor.
Preferred Shelf Number 
GN69.8 .B88 2023
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