
Title:
Industrial plasma engineering. Volume 2, Applications to nonthermal plasma processing
Author:
Roth, J. Reece., author.
ISBN:
9780429144110
Physical Description:
1 online resource (vii, 645 pages)
Contents:
chapter 14 Surface Interactions in Plasma Processing -- chapter 15 Atmospheric Pressure Plasma Sources -- chapter 16 Vacuum Plasma Sources -- chapter 17 Plasma Reactors for Plasma Processing -- chapter 18 Specialized Techniques and Devices for Plasma Processing -- chapter 19 Parametric Plasma Effects On Plasma Processing -- chapter 20 Diagnostics for Plasma Processing -- chapter 21 Plasma Treatment of Surfaces -- chapter 22 Surface Modification by Implantation and Diffusion -- chapter 23 Thin-Film Deposition by Evaporative Condensation and Sputtering -- chapter 24 Plasma Chemical Vapor Deposition (PCVD) -- chapter 25 Plasma Etching.
Electronic Access:
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Library | Material Type | Item Barcode | Shelf Number | Status | Item Holds |
|---|---|---|---|---|---|
Searching... | E-Book | 541062-1001 | TA2020 .R68 2001 | Searching... | Searching... |
