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Cover image for İyon bombardımanının reaktif DC magnetron kopartma tekniğiyle büyütülen metalik ince filimlerin yapısal ve elektriksel özellikleri üzerindeki etkileri
İyon bombardımanının reaktif DC magnetron kopartma tekniğiyle büyütülen metalik ince filimlerin yapısal ve elektriksel özellikleri üzerindeki etkileri
Author 
Duyar, Özlem.
Preferred Shelf Number 
TEZ/5234 D956 2001
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2. 
Cover image for Material characterization using ion beams. Org. by NATO, Aleria, Aug. 29 sept. 12, 1976
Material characterization using ion beams. Org. by NATO, Aleria, Aug. 29 sept. 12, 1976
Author 
Nato Advanced Study Institude on Material Characterization Using Ion Beams (1976 : Aleria, France). Thomas, J. P., ed. by Cachard, A., ed. by
Preferred Shelf Number 
QC 702.7.B65 N37 1976
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3. 
Cover image for Projected range statistics : semiconductors and related material
Projected range statistics : semiconductors and related material
Author 
Ginbbons, James F. Johnson, William S., ort. yaz. Mylroie, W., ort. yaz.
Preferred Shelf Number 
QC 793.3.E5 G5 1975
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4. 
Cover image for Ion implantation in semiconductors, silicon and germanium
Ion implantation in semiconductors, silicon and germanium
Author 
Mayer, James W., 1930- Eriksson, Lennart, ort. yaz. Davies, John A., ort. yaz.
Preferred Shelf Number 
TK 7871.85 M38 1970
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