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Cover image for Semiconductor materials analysis and fabrication process control proceedings of Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control of the 1992 E-MRS Spring Conference, Strasbourg, France, June 2-5, 1992
Semiconductor materials analysis and fabrication process control proceedings of Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control of the 1992 E-MRS Spring Conference, Strasbourg, France, June 2-5, 1992
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Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control (1992 : Strasbourg, France) Crean, G. M. Stuck, R. Woollam, John A. European Materials Research Society.
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ScienceDirect http://www.sciencedirect.com/science/book/9780444899088
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2. 
Cover image for Hydrogen in semiconductors bulk and surface properties : proceedings of the Sixth Trieste IUPAP-ICTP Semiconductor Symposium, International Centre for Theoretical Physics, Trieste, Italy, 27-31 August 1990
Hydrogen in semiconductors bulk and surface properties : proceedings of the Sixth Trieste IUPAP-ICTP Semiconductor Symposium, International Centre for Theoretical Physics, Trieste, Italy, 27-31 August 1990
Author 
Trieste ICTP-IUPAP Semiconductor Symposium (6th : 1990) Stutzmann, M. (Martin) Chevallier, J. (Jacques)
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ScienceDirect http://www.sciencedirect.com/science/book/9780444891389
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3. 
Cover image for Optical orientation
Optical orientation
Author 
Meier, F. (Felix), 1943- Zakharcheni͡a, Boris Petrovich.
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ScienceDirect http://www.sciencedirect.com/science/book/9780444867414
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