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1. 
Cover image for High-k gate dielectric materials : applications with advanced metal oxide semiconductor field effect transistors (MOSFETs)
High-k gate dielectric materials : applications with advanced metal oxide semiconductor field effect transistors (MOSFETs)
Author 
Maity, Niladri Pratap, editor. Maity, Reshmi, editor. Baishya, Srimanta, editor.
Preferred Shelf Number 
QC585
Electronic Access 
Taylor & Francis https://www.taylorfrancis.com/books/9780429325779
OCLC metadata license agreement http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf
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2. 
Cover image for Advanced indium arsenide-based HEMT architectures for terahertz applications
Advanced indium arsenide-based HEMT architectures for terahertz applications
Author 
Mohankumar, N., editor.
Preferred Shelf Number 
TK7871.95 .A38 2022
Electronic Access 
Taylor & Francis https://www.taylorfrancis.com/books/9781003093428
OCLC metadata license agreement http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf
Format: 
Availability 
Online Library~1
Available:
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