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1. 
Cover image for Photopolymers : photoresist materials, processes, and applications
Photopolymers : photoresist materials, processes, and applications
Author 
Nakamura, Kenichiro (Chemical engineer), author.
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ONLINE(356647.1)
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2. 
Cover image for Ultrafast laser processing from micro- to nanoscale
Ultrafast laser processing from micro- to nanoscale
Author 
Sugioka, K?ji. Cheng, Ya.
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ONLINE
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3. 
Cover image for Cross-linked liquid crystalline systems from rigid polymer networks to elastomers
Cross-linked liquid crystalline systems from rigid polymer networks to elastomers
Author 
Crawford, Gregory Philip. Broer, Dirk J. ?umer, Slobodan.
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4. 
Cover image for Photochemistry and photophysics of polymer materials
Photochemistry and photophysics of polymer materials
Author 
Allen, Norman S.
Preferred Shelf Number 
ONLINE
Electronic Access 
Books24x7 http://www.books24x7.com/marc.asp?bookid=35160
John Wiley http://dx.doi.org/10.1002/9780470594179
Safari Books Online http://proquest.safaribooksonline.com/640
Safari Books Online http://proquest.safaribooksonline.com/?fpi=9780470137963
http://site.ebrary.com/lib/alltitles/Doc?id=10377844
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