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International Conference on Advanced Materials (1991 : Strasbourg, France)
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1. 
Cover image for Silicon-On-Insulator (SOI) Technology Manufacture and Applications.
Silicon-On-Insulator (SOI) Technology Manufacture and Applications.
Author 
Kononchuk, O. Nguyen, B.-Y.
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ONLINE(355710.1)
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ScienceDirect http://www.sciencedirect.com/science/book/9780857095268
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Cover image for HeteroSiC & WASMPE 2011 selected, peer reviewed papers from the 4th Workshop on Advanced Semiconductor Materials and Devices for Power Electronics Applications (HeteroSiC & WASMPE 2011), June 27-30, 2011, Tours, France
HeteroSiC & WASMPE 2011 selected, peer reviewed papers from the 4th Workshop on Advanced Semiconductor Materials and Devices for Power Electronics Applications (HeteroSiC & WASMPE 2011), June 27-30, 2011, Tours, France
Author 
Alquier, Daniel.
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EBSCOhost http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=517109
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3. 
Cover image for Defects-recognition imaging and physics in semiconductors XIV selected peer reviewed papers from the 14th international conference on defects-recognition, imaging and physics in semiconductors, September 25-29, 2011, Miyazaki, Japan
Defects-recognition imaging and physics in semiconductors XIV selected peer reviewed papers from the 14th international conference on defects-recognition, imaging and physics in semiconductors, September 25-29, 2011, Miyazaki, Japan
Author 
International Conference on Defects: Recognition, Imaging and Physics in Semiconductors (2011 : Miyazaki, Japan) Yamada-Kaneta, Hiroshi. Sakai, Akira.
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4. 
Cover image for Technology evolution for silicon nano-electronics selected, peer reviewed papers from the proceedings of the International Symposium on Technology Evolution for Silicon Nano-Electronics 2010, June 3-5, 2010, Tokyo Institute of Technology, Tokyo, Japan
Technology evolution for silicon nano-electronics selected, peer reviewed papers from the proceedings of the International Symposium on Technology Evolution for Silicon Nano-Electronics 2010, June 3-5, 2010, Tokyo Institute of Technology, Tokyo, Japan
Author 
International Symposium on Technology Evolution for Silicon Nano-Electronics (2010 : Tokyo Institute of Technology) Miyazaki, Seiichi. Tabata, Hitoshi.
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5. 
Cover image for Nanoscaled semiconductor-on-insulator materials, sensors and devices selected, peer reviewed papers from the 6th International Workshop on Semiconductor-on-Insulator Materials and Devices, 24-28 October, 2010 Kyiv, Ukraine
Nanoscaled semiconductor-on-insulator materials, sensors and devices selected, peer reviewed papers from the 6th International Workshop on Semiconductor-on-Insulator Materials and Devices, 24-28 October, 2010 Kyiv, Ukraine
Author 
International Workshop on Semiconductor-on-Insulator Materials and Devices (6th : 2010 : Kiev, Ukraine) Nazarov, A. N. (Alexei N.) Raskin, J.-P. (Jean-Pierre), 1971-
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6. 
Cover image for Processing of nanoparticle structures and composites a collection of papers presented at the 2008 Materials Science and Technology Conference (MS & T08) October 5-9, 2008, Pittsburgh, Pennsylvania
Processing of nanoparticle structures and composites a collection of papers presented at the 2008 Materials Science and Technology Conference (MS & T08) October 5-9, 2008, Pittsburgh, Pennsylvania
Author 
Materials Science & Technology Conference (2008 : Pittsburgh, Pa.) Hinklin, Tom. Lu, Kathy. Wiley InterScience (Online service)
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John Wiley http://dx.doi.org/10.1002/9780470551523
http://site.ebrary.com/lib/alltitles/Doc?id=10341612
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7. 
Cover image for Passivation of metals and semiconductors, and properties of thin oxide layers a selection of papers from the 9th International Symposium, Paris, France, 27 June-1 July 2005
Passivation of metals and semiconductors, and properties of thin oxide layers a selection of papers from the 9th International Symposium, Paris, France, 27 June-1 July 2005
Author 
International Symposium on the Passivation of Metals and Semiconductors and the Properties of Thin Oxide Layers (9th : 2005 : Paris, France) Marcus, P. (Philippe), 1953- Maurice, Vincent.
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8. 
Cover image for Rapid thermal processing for future semiconductor devices proceedings of the 2001 International Conference on Rapid Thermal Processing for Future Semiconductor Devices (RTP 2001), held at Ise-Shima, Mie, Japan, November 14-16, 2001
Rapid thermal processing for future semiconductor devices proceedings of the 2001 International Conference on Rapid Thermal Processing for Future Semiconductor Devices (RTP 2001), held at Ise-Shima, Mie, Japan, November 14-16, 2001
Author 
International Conference on Rapid Thermal Processing for Future Semiconductor Devices (2nd : 2001 : Ise-Shima, Mie, Japan) Fukuda, Hisashi.
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ScienceDirect http://www.sciencedirect.com/science/book/9780444513397
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9. 
Cover image for Physics and applications of semiconductor quantum structures proceedings of the International Workshop on Physics and Applications of Semiconductor Quantum Structures (Asian Science Seminar), Cheju Island, Korea, October 18-23, 1998
Physics and applications of semiconductor quantum structures proceedings of the International Workshop on Physics and Applications of Semiconductor Quantum Structures (Asian Science Seminar), Cheju Island, Korea, October 18-23, 1998
Author 
International Workshop on Physics and Applications of Semiconductor Quantum Structures (1998 : Cheju Island, Korea) Yao, Takafumi. Woo, Jong-Chun. Kikai Shink? Ky?kai. Han'guk Kwahak Chaedan.
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10. 
Cover image for Selected Topics in Group IV and II-VI Semiconductors Proceedings of Symposium L and Symposium D of the 1995 E-Mrs Spring Conference, Strasbourg, France, 22-26 May 1995
Selected Topics in Group IV and II-VI Semiconductors Proceedings of Symposium L and Symposium D of the 1995 E-Mrs Spring Conference, Strasbourg, France, 22-26 May 1995
Author 
International Symposium on Silicon Molecular Beam Epitaxy (6th : 1995 : Strasbourg, France) Kasper, E.
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ScienceDirect http://www.sciencedirect.com/science/book/9780444824110
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11. 
Cover image for C, H, N and O in Si and Characterization and Simulation of Materials and Processes Proceedings of Symposium N and Symposium G of the 1995 E-Mrs Spring Conference, Held in Strasbourg, France, 22-26 May 1995
C, H, N and O in Si and Characterization and Simulation of Materials and Processes Proceedings of Symposium N and Symposium G of the 1995 E-Mrs Spring Conference, Held in Strasbourg, France, 22-26 May 1995
Author 
Symposium N on Carbon, Hydrogen, Nitrogen, and Oxygen in Silicon and Other Elemental Semiconductors (1995 : Strasbourg, France) Borghesi, A. Symposium G on Atomic Scale Characterization and Simulation of Materials and Processes (1995 : Strasbourg, France)
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12. 
Cover image for Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992
Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992
Author 
International Conference on Ion Implantation Technology (9th : 1992 : Gainesville, Fla.) Downey, D. F.
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ScienceDirect http://www.sciencedirect.com/science/book/9780444899941
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