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1. 
Cover image for Materials and Processes for Next Generation Lithography.
Materials and Processes for Next Generation Lithography.
Author 
Robinson, Alex, editor. Lawson, Richard, editor.
Preferred Shelf Number 
ONLINE
Electronic Access 
ScienceDirect https://www.sciencedirect.com/science/bookseries/18762778/11
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Online Library~1
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2. 
Cover image for Photopolymers : photoresist materials, processes, and applications
Photopolymers : photoresist materials, processes, and applications
Author 
Nakamura, Kenichiro (Chemical engineer), author.
Preferred Shelf Number 
ONLINE(356647.1)
Electronic Access 
Distributed by publisher. Purchase or institutional license may be required for access.
Format: 
Availability 
Online Library~1
Available:
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