Limit Search Results
Author
Language
Publication Date
-
Subject
Material Type
Shelf Location
Library
Switch to list view
Switch to thumbnail view
2 Results Found Subscribe to search results
00DEFAULT
Print
1. 
Cover image for Photopolymers : photoresist materials, processes, and applications
Photopolymers : photoresist materials, processes, and applications
Author 
Nakamura, Kenichiro (Chemical engineer), author.
Preferred Shelf Number 
ONLINE(356647.1)
Electronic Access 
Distributed by publisher. Purchase or institutional license may be required for access.
Format: 
Availability 
Online Library~1
Available:
Copies:
2. 
Cover image for Photochemistry and photophysics of polymer materials
Photochemistry and photophysics of polymer materials
Author 
Allen, Norman S.
Preferred Shelf Number 
ONLINE
Electronic Access 
Books24x7 http://www.books24x7.com/marc.asp?bookid=35160
John Wiley http://dx.doi.org/10.1002/9780470594179
Safari Books Online http://proquest.safaribooksonline.com/640
Safari Books Online http://proquest.safaribooksonline.com/?fpi=9780470137963
http://site.ebrary.com/lib/alltitles/Doc?id=10377844
Format: 
Availability 
Online Library~1
Available:
Copies:
Go to:Search Results
|
Top of Page
|
Search Facets