Search Results for Photoresists.SirsiDynix Enterprisehttps://katalog.hacettepe.edu.tr/client/en_US/default/default/qu$003dPhotoresists.$0026te$003dILS$0026ps$003d300?dt=list2024-12-23T05:06:17ZMaterials and Processes for Next Generation Lithography.ent://SD_ILS/0/SD_ILS:4592262024-12-23T05:06:17Z2024-12-23T05:06:17ZAuthor Robinson, Alex, editor. Lawson, Richard, editor.<br/>Preferred Shelf Number ONLINE<br/>Electronic Access ScienceDirect <a href="https://www.sciencedirect.com/science/bookseries/18762778/11">https://www.sciencedirect.com/science/bookseries/18762778/11</a><br/>Format: Electronic Resources<br/>Availability Online Library~1<br/>Photopolymers : photoresist materials, processes, and applicationsent://SD_ILS/0/SD_ILS:3566472024-12-23T05:06:17Z2024-12-23T05:06:17ZAuthor Nakamura, Kenichiro (Chemical engineer), author.<br/>Preferred Shelf Number ONLINE(356647.1)<br/>Electronic Access <a href="http://marc.crcnetbase.com/isbn/9781466517318">Distributed by publisher. Purchase or institutional license may be required for access.</a><br/>Format: Electronic Resources<br/>Availability Online Library~1<br/>Polymers in microlithography : materials and processesent://SD_ILS/0/SD_ILS:1091622024-12-23T05:06:17Z2024-12-23T05:06:17ZAuthor Reichmanis, Elsa, 1953-, ed. MacDonald, Scott A., ed. Iwayanagi, Takao, 1949-, ed. American Chemical Society. Division of Polymeric Materials: Science and Engineering.<br/>Preferred Shelf Number TK7871.15.P6 P635 1989<br/>Format: Books<br/>Availability Beytepe Library~1<br/>