Arama Sonu&ccedil;lar&#305; Grinding and polishing. - Daralt&#305;lm&#305;&#351;: English SirsiDynix Enterprise https://katalog.hacettepe.edu.tr/client/tr_TR/default_tr/default_tr/qu$003dGrinding$002band$002bpolishing.$0026qf$003dLANGUAGE$002509Dil$002509ENG$002509English$0026ps$003d300? 2024-11-11T06:21:48Z Handbook of ceramics grinding and polishing ent://SD_ILS/0/SD_ILS:355322 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Marinescu, Ioan D., editor.&#160;Doi, Toshiro K., 1947- editor.&#160;Uhlmann, Eckart, editor.<br/>Yer Numaras&#305;&#160;ONLINE(355322.1)<br/>Elektronik Eri&#351;im&#160;ScienceDirect <a href="http://www.sciencedirect.com/science/book/9781455778584">http://www.sciencedirect.com/science/book/9781455778584</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Handbook of ceramic grinding and polishing ent://SD_ILS/0/SD_ILS:256459 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Marinescu, Ioan D.&#160;T&ouml;nshoff, H. K. (Hans Kurt)&#160;Inasaki, Ichiro.<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;ScienceDirect <a href="http://www.sciencedirect.com/science/book/9780815514244">http://www.sciencedirect.com/science/book/9780815514244</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Intelligent Robotics and Applications 16th International Conference, ICIRA 2023, Hangzhou, China, July 5-7, 2023, Proceedings, Part V ent://SD_ILS/0/SD_ILS:521247 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Yang, Huayong. editor.&#160;Liu, Honghai. editor.&#160;Zou, Jun. editor.&#160;Yin, Zhouping. editor.&#160;Liu, Lianqing. editor. (orcid)<br/>Yer Numaras&#305;&#160;XX(521247.1)<br/>Elektronik Eri&#351;im&#160;<a href="https://doi.org/10.1007/978-981-99-6495-6">https://doi.org/10.1007/978-981-99-6495-6</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Intelligent Robotics and Applications 16th International Conference, ICIRA 2023, Hangzhou, China, July 5-7, 2023, Proceedings, Part VI ent://SD_ILS/0/SD_ILS:521218 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Yang, Huayong. editor.&#160;Liu, Honghai. editor.&#160;Zou, Jun. editor.&#160;Yin, Zhouping. editor.&#160;Liu, Lianqing. editor. 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Brian.<br/>Yer Numaras&#305;&#160;ONLINE(356128.1)<br/>Elektronik Eri&#351;im&#160;ScienceDirect <a href="http://www.sciencedirect.com/science/book/9780323242714">http://www.sciencedirect.com/science/book/9780323242714</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Tribology of abrasive machining processes ent://SD_ILS/0/SD_ILS:146924 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Marinescu, Ioan D.<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;ScienceDirect <a href="http://www.sciencedirect.com/science/book/9781437734676">http://www.sciencedirect.com/science/book/9781437734676</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Advances in CMP/polishing technologies for the manufacture of electronic devices ent://SD_ILS/0/SD_ILS:146106 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Doi, Toshiro.&#160;Marinescu, Ioan D.&#160;Kurokawa, Syuhei.<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;ScienceDirect <a href="http://www.sciencedirect.com/science/book/9781437778595">http://www.sciencedirect.com/science/book/9781437778595</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Modern grinding techniques ent://SD_ILS/0/SD_ILS:298480 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Rowe, W. B. (William Brian)&#160;Wiley InterScience (Online service)<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;John Wiley <a href="http://dx.doi.org/10.1002/9780470882313">http://dx.doi.org/10.1002/9780470882313</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Principles of modern grinding technology ent://SD_ILS/0/SD_ILS:147305 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Rowe, W. B. (William Brian)<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;ScienceDirect <a href="http://www.sciencedirect.com/science/book/9780815520184">http://www.sciencedirect.com/science/book/9780815520184</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Handbook of machining with grinding wheels ent://SD_ILS/0/SD_ILS:289382 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Marinescu, Ioan D.<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;<a href="http://marc.crcnetbase.com/isbn/9781420017649">Distributed by publisher. 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Purchase or institutional license may be required for access.</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Tribology in chemical-mechanical planarization ent://SD_ILS/0/SD_ILS:119554 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Liang, Hong.&#160;Craven, David.<br/>Yer Numaras&#305;&#160;TJ1075 .L53 2005<br/>Format:&#160;Kitap<br/>Durum&#160;Beytepe K&uuml;t&uuml;phanesi~1<br/> Tribology of abrasive machining processes ent://SD_ILS/0/SD_ILS:256479 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Marinescu, Ioan D.<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;ScienceDirect <a href="http://www.sciencedirect.com/science/book/9780815514909">http://www.sciencedirect.com/science/book/9780815514909</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Silicon Wafer Bonding Technology for VLSI and MEMS Applications ent://SD_ILS/0/SD_ILS:247777 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Iyer, S. S., ed.&#160;Auberton-Herv&#65533;, A. J., e<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;<a href="http://dx.doi.org/10.1049/PBEP001E">http://dx.doi.org/10.1049/PBEP001E</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/> Chemical mechanical planarization of microelectronic materials ent://SD_ILS/0/SD_ILS:300816 2024-11-11T06:21:48Z 2024-11-11T06:21:48Z Yazar&#160;Steigerwald, Joseph M.&#160;Murarka, S. P.&#160;Gutmann, Ronald J.&#160;Wiley InterScience (Online service)<br/>Yer Numaras&#305;&#160;ONLINE<br/>Elektronik Eri&#351;im&#160;John Wiley <a href="http://dx.doi.org/10.1002/9783527617746">http://dx.doi.org/10.1002/9783527617746</a> Contributor biographical information <a href="http://catdir.loc.gov/catdir/bios/wiley041/96006198.html">http://catdir.loc.gov/catdir/bios/wiley041/96006198.html</a><br/>Format:&#160;Elektrnik Kaynak<br/>Durum&#160;&Ccedil;evrimi&ccedil;i K&uuml;t&uuml;phane~1<br/>