Arama Sonuçları Photoresists.SirsiDynix Enterprisehttps://katalog.hacettepe.edu.tr/client/tr_TR/default_tr/default_tr/qu$003dPhotoresists.$0026ic$003dtrue$0026ps$003d300?2025-03-14T10:15:44ZMaterials and Processes for Next Generation Lithography.ent://SD_ILS/0/SD_ILS:4592262025-03-14T10:15:44Z2025-03-14T10:15:44ZYazar Robinson, Alex, editor. Lawson, Richard, editor.<br/>Yer Numarası ONLINE<br/>Elektronik Erişim ScienceDirect <a href="https://www.sciencedirect.com/science/bookseries/18762778/11">https://www.sciencedirect.com/science/bookseries/18762778/11</a><br/>Format: Elektrnik Kaynak<br/>Durum Çevrimiçi Kütüphane~1<br/>Photopolymers : photoresist materials, processes, and applicationsent://SD_ILS/0/SD_ILS:3566472025-03-14T10:15:44Z2025-03-14T10:15:44ZYazar Nakamura, Kenichiro (Chemical engineer), author.<br/>Yer Numarası ONLINE(356647.1)<br/>Elektronik Erişim <a href="http://marc.crcnetbase.com/isbn/9781466517318">Distributed by publisher. Purchase or institutional license may be required for access.</a><br/>Format: Elektrnik Kaynak<br/>Durum Çevrimiçi Kütüphane~1<br/>Polymers in microlithography : materials and processesent://SD_ILS/0/SD_ILS:1091622025-03-14T10:15:44Z2025-03-14T10:15:44ZYazar Reichmanis, Elsa, 1953-, ed. MacDonald, Scott A., ed. Iwayanagi, Takao, 1949-, ed. American Chemical Society. Division of Polymeric Materials: Science and Engineering.<br/>Yer Numarası TK7871.15.P6 P635 1989<br/>Format: Kitap<br/>Durum Beytepe Kütüphanesi~1<br/>