part Part I: Exposure System -- chapter 1 System Overview of Optical Steppers and Scanners -- chapter 2 Optical Lithography Modeling -- chapter 3 Optics for Photolithography -- chapter 4 Excimer Laser for Advanced Microlithography -- chapter 5 Alignment and Overlay -- chapter 6 Electron Beam Lithography Systems -- chapter 7 X-ray Lithography -- chapter 8 EUV Lithography -- chapter 9 Imprint Lithography -- part Part II: Resists and Processing -- chapter 10 Chemistry of Photoresist Materials -- chapter 11 Resist Processing -- chapter 12 Multilayer Resist Technology -- chapter 13 Dry Etching of Photoresists -- part Part III: Metrology and Nanolithography -- chapter 14 Critical-Dimensional Metrology for Integrated-Circuit Technology -- chapter 15 Electron Beam Nanolithography.