X-ray metrology in semiconductor manufacturing
tarafından
Bowen, D. Keith (David Keith), 1940- author.
Başlık
:
X-ray metrology in semiconductor manufacturing
Yazar
:
Bowen, D. Keith (David Keith), 1940- author.
ISBN
:
9781315222035
Fiziksel Tanımlama
:
1 online resource (279 pages)
İçerik
:
chapter 1 Introduction -- chapter 2 Thickness Metrology -- chapter 3 Composition and Phase Metrology -- chapter 4 Strain and Stress Metrology -- chapter 5 Mosaic Metrology -- chapter 6 Interface Roughness Metrology -- chapter 7 Porosity Metrology -- chapter 8 Specular X-ray Reflectivity -- chapter 9 X-ray Diffuse Scattering -- chapter 10 Theory of XRD on Polycrystals -- chapter 11 High-Resolution XRD on Single Crystals -- chapter 12 Diffraction Imaging and Defect Mapping -- chapter 13 Modeling and Analysis -- chapter 14 Instrumentation -- chapter 15 Accuracy and Precision of X-ray Metrology.
Konu Terimleri
:
Fluroscopy.
Integrated circuits -- Measurement.
Semiconductor wafers -- Inspection.
Semiconductors -- Design and construction -- Quality control.
X-rays -- Diffraction.
Yazar Ek Girişi
:
Tanner, B. K. (Brian Keith)
Elektronik Erişim
:
| Kütüphane | Materyal Türü | Demirbaş Numarası | Yer Numarası | [[missing key: search.ChildField.HOLDING]] | Durumu/İade Tarihi |
|---|
| Çevrimiçi Kütüphane | E-Kitap | 543511-1001 | TK7874.58 .B69 2006 | | CRC E-Books |