PrefaceStresses in thin filmsJ. Bøttiger, J. Chevallier, P. Kringhøj and K.O. SchweitzFundamental aspects of residual stress evolution in thin metal films during energetic particle depositionA. Misra and M. NastasiSurface stress effects on the intrinsic stress in thin filmsR.C. CammarataInfluence of the ion bombardment on the stress in thin films produced by ion beam and RF sputtering techniquesS. Scaglione, F. Sarto, A. Rizzo, M. Alvisi and M.A. TaglienteDelamination of thin hard coatings induced by combined residual stress and topographyU. Wiklund, S. Hogmark and J. GunnarsEffects of surface treatments on the adhesion of metallic films to ceramic substratesA.J. PedrazaThe state-of-the-art in adhesion of CVD diamond to carbide cutting insertsM.A. Taher, W.F. Schmidt, A.P. Malshe, E.J. Oles and A. InspektorAdhesion improvement of diamond films to silicon nitride substrate for cutting toolsH. Itoh, R. Sasai, M. Kamiya, S.-S. Lee, K. Kuroda and T. TsutsumotoQuantifying the effect of carbon on the practical adhesion of aluminum films to sapphire substratesJ.A. Schneider, S.E. Guthrie, W.M. Clift and N.R. MoodyThe effect of a titanium-based interlayer on the adhesion of ceramic coatingsM.T. Vieira, S. Roque and A.S. RamosEffect of annealing on residual stress, strength, adhesion and wear resistance of thin, hard coatings on low alloy steelT.Z. Kattamis and C.G. FountzoulasStudy of adhesion and tribological properties of some ceramic filmsJ. Takadoum and B. CretinProperties of oxide coatings deposited on a plastic substrate by a successive pulsed plasma anodisation processB.M. Henry, A.G. Erlat, C.R.M. Grovenor, G.A.D. Briggs and R.P. HowsonPractiacal adhesion of organic coatings to metals: The role of the interphase and its residual stressesJ. Bouchet, A.A. Roche, E. Jacquelin and G.W. SchererEpoxy – diamine adhesives on metal: The interphase formation and characterizationS. Bentadjine, A.A. Roche and J. BouchetImproving the adhesion of plasma polymerized thin fluorocarbon films on silicon using (CHF3 + SF6) radio-frequency discharge pretreatmentsV. Ianev and N. Schwesinger.